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  2. Phase-shift mask - Wikipedia

    en.wikipedia.org/wiki/Phase-shift_mask

    Phase-shift masks are photomasks that take advantage of the interference generated by phase differences to improve image resolution in photolithography. There exist alternating [1] and attenuated phase shift masks. [2] A phase-shift mask relies on the fact that light passing through a transparent media will undergo a phase change as a function ...

  3. SDS-PAGE - Wikipedia

    en.wikipedia.org/wiki/SDS-PAGE

    SDS-PAGE ( sodium dodecyl sulfate–polyacrylamide gel electrophoresis) is a discontinuous electrophoretic system developed by Ulrich K. Laemmli which is commonly used as a method to separate proteins with molecular masses between 5 and 250 kDa. [1] [2] The combined use of sodium dodecyl sulfate (SDS, also known as sodium lauryl sulfate) and ...

  4. Gel electrophoresis of proteins - Wikipedia

    en.wikipedia.org/wiki/Gel_electrophoresis_of...

    Gel electrophoresis of proteins. Protein electrophoresis is a method for analysing the proteins in a fluid or an extract. The electrophoresis may be performed with a small volume of sample in a number of alternative ways with or without a supporting medium, namely agarose or polyacrylamide. Variants of gel electrophoresis include SDS-PAGE, free ...

  5. Unsharp masking - Wikipedia

    en.wikipedia.org/wiki/Unsharp_masking

    Unsharp masking ( USM) is an image sharpening technique, first implemented in darkroom photography, but now commonly used in digital image processing software. Its name derives from the fact that the technique uses a blurred, or "unsharp", negative image to create a mask of the original image. The unsharp mask is then combined with the original ...

  6. Photoresist - Wikipedia

    en.wikipedia.org/wiki/Photoresist

    A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface. In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer will dissolve away the regions that were ...

  7. Photomask - Wikipedia

    en.wikipedia.org/wiki/Photomask

    Photomask. A schematic illustration of a photomask (top) and an IC layer printed using it (bottom) A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips ...

  8. Joint Service General Purpose Mask M-50/M-51 - Wikipedia

    en.wikipedia.org/wiki/Joint_Service_General...

    2006–present. Specifications. Weight. 1.9 lbs (M50) The M50 series protective mask, officially known as the Joint Service General Purpose Mask ( JSGPM or JSGPM/M50 ), is a lightweight, protective mask system consisting of the mask, a mask carrier, and additional accessories. It was adopted by the U.S. military in 2006 and is manufactured by ...

  9. M40 field protective mask - Wikipedia

    en.wikipedia.org/wiki/M40_Field_Protective_Mask

    The M40 field protective mask features three voicemitters, one on either the right or left side, and one in front. A voicecom adapter may be placed over the front voicemitter to amplify the user's voice. The mask can be adjusted in the field to accept the filtering canister on either side, so that a weapon may be shouldered.

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